型號
Model |
應用特點(diǎn)
Application field |
裝片工作臺特點(diǎn)
Features of film loading bench |
基片尺寸
Size of substrate |
產(chǎn)量/每小時(shí)
1μ鋁層厚度
Output per hour 1μm aluminum coating thickness |
厚度
均勻性
thickness homogeneity |
真空系統
Vacuum system |
| JC400-1/D |
適合科研、生產(chǎn)硅片及砷化鎵片
Scientific research,production of silicon film and gallium arsenide film |
全自動(dòng)盒對盒送片，濺射源數量可按工藝調整，低塵粒
Full automatic box-to-box film advance;quantity of sputtering source to be adiusted as per the process;low in density of dust particles |
4～6″ |
40 |
±5％ |
低溫泵加
分子泵系統
Cryogenic pump system added with molecular pump |
| JC500-1/D |
適用于圓形片狀工件
Circular sheet work-piece |
工件可進(jìn)行公轉，水平裝片
Revolution of work-piece available；horizontal film loading |
4″ |
16 |
±8％ |
分子泵系統
Turbomolecular pump system |
| JC500-5/D |
適用于矩形片狀工件
Rectangular sheet work-piecevv |
工件可進(jìn)行公轉，垂直裝片
Revolution of work-piece available；vertical film loading |
150x150mm |
10 |
±8％ |
分子泵系統
Turbomolecular pump system |
| JC600-1/D |
適用于矩形片狀工件
Rectangular sheet work-piecevv |
工件架為十邊拄形，垂直裝片
work-piece holder in decagonal column shape；vertical film loading |
280x100mm |
20 |
±8％ |
擴散泵系統
Diffusion pump system |
| JC600-2/D |
適合科研、生產(chǎn)砷化鎵基片線(xiàn)寬亞微米級
Scientific research,production of gallium arsenide film with line width at submicron level |
工件可進(jìn)行自傳、公轉
水平裝片
Rotation and revolution of work-piece available；horizontal film loading |
3″ |
24 |
±5％ |
低溫泵系統
Cryogenic pump system |
| JC650-1/D |
適用于矩形或圓形片狀工件
Rectangular or circular sheet work-piece |
工件可進(jìn)行公轉，水平裝片
revolution of work-piece available；horizontal film loading |
Φ100mm |
10 |
±5％ |
分子泵系統
Turbomolecular pump system |
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