<video id="fbtph"></video><address id="fbtph"></address>

    <video id="fbtph"></video>
    
    

          您好,歡迎光臨成都南光機器有限公司 English / 簡(jiǎn)體中文
          ?GFC系列高性能全自動(dòng)真空鍍膜機
          • 用途及特點(diǎn)
          • 規格參數
            用途及特點(diǎn)
            Use and Features
             
            ●適應于玻璃、塑膠等基片上鍍制各類(lèi)光學(xué)薄膜和其它機能性裝飾薄膜的批量化生產(chǎn)
            ●采用******的電氣控制系統,良好的用戶(hù)操作界面,大大減輕作業(yè)人員的負擔
            ●RCS自動(dòng)鍍膜控制系統******整個(gè)鍍膜過(guò)程自動(dòng)完成
            ●基片架轉動(dòng)采用磁流體密封技術(shù)******真空密封,中心驅動(dòng)方式******薄膜產(chǎn)品的均勻性及重復性
            ●優(yōu)化的配置、嚴格的品質(zhì)控制******產(chǎn)品質(zhì)量的穩定性和重復性
            ●排氣速率.鍍膜效率的提高,大大縮短了產(chǎn)品生產(chǎn)周期
            GFC系列高性能全自動(dòng)真空鍍膜機
            Series GFC High Quality Vacuum Thin Film Coater
            技術(shù)參數
            Technical parameters
            真空室體
            Vacuum chamber
            Ø1300*1450mm,SUS304材質(zhì)
            φ1,300*1,450mm,SUS304 material
             
            排氣系統
            Air exhaust system
            KT-500擴散泵2臺,總排氣速率(加載水冷阱)11,000Pa.L/S
            Two sets of KT-500 diffusion pump, with a gross exhaust velocity (loaded with water-cooling trap) of 11,000Pa.L/S;
            極限真空≤2.0E-4Pa;排氣時(shí)間≤15min(大氣→4.0E-3Pa)
            Ultimate vacuum ≤2.0E-4Pa; exhaust time ≤15min (atmosphere→4.0E-3Pa)
            基片架
            Substrate holder
            Ø1200四葉扇形基片架, 3~30rpm轉速;可選配行星基片架、翻轉機構等
            φ1200 four-blade sector-shaped substrate holder, rotating speed 3~30rpm; a planet substrate holder or a turnover mechanism can also be matched;
            加熱機構
            Heating means
            ******350℃,PID控制;恒溫20min后溫度均勻性250±10℃
            Maximum 350℃, PID control; temperature homogeneity being 250±10℃ after 20 min of constant temperature control;
            石英監控儀
            Quartz monitor
            進(jìn)口石英晶體膜厚監控儀;2點(diǎn)(或6點(diǎn))晶振探頭
            Imported quartz crystal monitor on film depth, with two-point (or six-point) crystal probe;
            電子束蒸發(fā)源
            Electron beam evaporation source
            10KW電子槍 2臺,12點(diǎn)坩堝和環(huán)形坩堝
            Two sets of 10KW electron gun, 12-point crucible or ring-shaped crucible;
            電阻蒸發(fā)源
            Resistance evaporation source
            功率4KW(一對、兩對或多對)
            Power of 4KW (one pair, two pairs or more pairs)
            膜厚修正板
            Film depth correction board
            2個(gè)自動(dòng)可倒式膜厚修正機構
            Two automatic film depth correction mechanisms of collapsible type
            反應氣體
            Reaction gas
            APC自動(dòng)壓強控制儀,質(zhì)量流量計
            APC automatic pressure controller, mass flowmeter
            離子源
            Ion source
            可選配Kafman、Holl或RF離子源
            Available for matching of Kafman, Holl or RF ion source
            低溫抽氣裝置
            Low temperature evacuating equipment
            進(jìn)口低溫抽氣裝置有效捕集水蒸汽,******溫度-130℃
            The imported low-temperature evacuating equipment can effectively gather water vapor; minimum temperature -130℃
            RCS系統
            RCS system
            基于WINDOWS的全自動(dòng)鍍膜軟件
            Windows-based full automatic coating software
            控制系統
            Control system
            控制柜(液晶觸摸式彩色顯示器),遠程控制遙控盒
            Control cabinet (with liquid crystal color touch screen), remote-control box for remote control
             
            消耗能源
            Energy consumption
            3相,220/380VAC,50Hz;~70KVA
            Three-phase, 220/380VAC,50Hz;~70KVA
            水流量140L/min,壓力0.3~0.5MPa
            Water flow 140L/min, pressure 0.3~0.5MPa
            壓縮空氣0.5MPa~0.7MPa
            Compressed air 0.5MPa~0.7MPa
            重    量
            Weight
            凈重約4500Kg
            Net weight about 4,500 Kg
            安裝空間
            Installation space
            W4000mmxD6000mmxH2700mm
            W4,000mm×D6,000mm×H2,700mm
             

          国产精品爆乳无码一区二区三区|国产情侣一区二区三区|日韩AV免费精品一区二区三区|国产精品久久久久久无码AV

          <video id="fbtph"></video><address id="fbtph"></address>

            <video id="fbtph"></video>